Influence of postoperative low-level laser therapy on crestal bone levels around dental implants

Influence of postoperative low-level laser therapy using laser diode 940 nm on crestal bone levels around dental implants

Status

Active, not recruiting

Phases

Unknown

Study type

Interventional

Source

IRCT

Registry ID

IRCT20220205053946N1

Enrollment

Registered

2022-05-09

Start date

2022-02-09

Completion date

Unknown

Last updated

2022-05-30

For informational purposes only — not medical advice. Sourced from public registries and may not reflect the latest updates. Terms

Conditions

loss of teeth.

Interventions

Intervention 1: Intervention group: An implant is placed on each side on opposite sides of a jaw in the same area, and immediately, using the split-mouth method, with a low-power 940 nm diode laser wi

Eligibility

Sex/Gender

All

Age

20 Years to 55 Years

Inclusion criteria

Inclusion criteria: The applicants of implant treatment that two-sided in a jaw in a similar area have lost tooth. tooth extraction at least 6 months before implant surgery; nongrafted implant site; type 2 or 3 bone quality according to the Lekholm and Zarb classification, adequate space with buccolingual width of minimum 6 mm and mesiodistal width of minimum 7 mm; inter-occlusal distance greater than 7 mm.

Exclusion criteria

Exclusion criteria: Pregnant women. Any mental illness and psychological and behavioral conditions, which is the absolute contraction of implant treatment. Any systemic illness that contraindicates surgery; uncontrolled diabetes mellitus; bisphosphonate therapy; history of radiotherapy in the maxillofacial region within last 12 months; smoking; para-functional habits; poor oral hygiene with full mouth plaque score and full mouth bleeding score =25%, periodontally compromised patients with attachment loss =3 mm, and/or radiographic bone loss =30% of root length in =30% of sites and those who refused to return for follow-up were excluded from this study.

Design outcomes

Primary

Measure	Time frame
Measuring crestal bone levels around dental implants by radiography. Timepoint: Crestal bone level at 4 time 1) immediately after receiving of 940 nm (T0) laser (T0) 2) 6 weeks after receiving laser diode 940 nm (T1) 3) 6 months after receiving low-laser diode 940 nm (T2) Using parallel-based digital periametic radiography, measured by parallel technique. Method of measurement: Using parallel-based digital periametic radiography, measured by parallel technique.	—

Measure

Time frame

Measuring crestal bone levels around dental implants by radiography. Timepoint: Crestal bone level at 4 time 1) immediately after receiving of 940 nm (T0) laser (T0) 2) 6 weeks after receiving laser diode 940 nm (T1) 3) 6 months after receiving low-laser diode 940 nm (T2) Using parallel-based digital periametic radiography, measured by parallel technique. Method of measurement: Using parallel-based digital periametic radiography, measured by parallel technique.

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Countries

Iran (Islamic Republic of)

Contacts

Public ContactDr. Ehsan Momeni

Arak University of Medical Sciences

momeni8384@gmail.com+98 86 3369 1355

Outcome results

None listed

Source: IRCT (via WHO ICTRP) · Data processed: Feb 4, 2026